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Monte Carlo Modeling for Electron Microscopy and Microanalysis (Oxford Series in Optical and Imaging Sciences, 9)
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About Monte Carlo Modeling For Electron Microscopy And
Product Description This book describes for the first time how Monte Carlo modeling methods can be applied to electron microscopy and microanalysis. Computer programs for two basic types of Monte Carlo simulation are developed from physical models of the electron scattering process--a single scattering program capable of high accuracy but requiring long computation times, and a plural scattering program which is less accurate but much more rapid. Optimized for use on personal computers, the programs provide a real time graphical display of the interaction. The programs are then used as the starting point for the development of programs aimed at studying particular effects in the electron microscope, including backscattering, secondary electron production, EBIC and cathodo-luminescence imaging, and X-ray microanalysis. The computer code is given in a fully annotated format so that it may be readily modified for specific problems. Throughout, the author includes numerous examples of how such applications can be used. Students and professionals using electron microscopes will want to read this important addition to the literature. Review "For what it aspires to accomplish, this book succeeds and can be recommended on that basis." -- Journal of the American Chemical Society "Provides an outstanding introduction for the Microscopist seeking to make new use of this powerful simulation tool, as well as a great resource for established modelers looking to extend their knowledge. . .clearly written and strongly supported by practical examples throughout." -- Radiation Physics and Chemistry About the Author David C. Joy is at University of Tennessee, Knoxville.
